Whoops! This page slipped beyond our depth of field. 

Let's bring your search back in focus  ↓

This page may have scattered—but our fresh content is perfectly collimated. Explore below:

Image
The Optikos Ultra-High Precision Polarization Metrology for Semiconductor Manufacturing
Optikos created a custom polarimeter that enabled ultra-precise polarization metrology for semiconductor lithography systems, transforming a one-off solution into a 12+ year production partnership for advanced chip manufacturing.
Read the Study
optical system design prototype
From Clean Sheet Design to Operational Proof-of-Concept
Optikos rapidly transformed a fragile breadboard DNA/RNA detection concept into 15 reliable, long‑lasting demonstrator units. Using a gated medical‑device development process, multidisciplinary engineering, and strategic partnerships, Optikos delivered a robust optical detection platform that continues to support ongoing R&D years later.
Read the Study
Semiconductor · Wafer Overlay Metrology
Optikos Enables Next‑Generation Wafer‑Overlay Metrology Platform
Optikos designed and manufactured a custom wafer overlay imaging module featuring sub‑micron repeatability, metrology‑grade stability, and complete optical and mechanical IP ownership.
Read the Study
Optikos OpTest System
Giving Stray Light a Home
Optikos identified and eliminated a critical stray light issue by combining advanced Zemax modeling, precision metrology, and targeted opto‑mechanical redesign—achieving over 10× reduction in unwanted reflections.
Read the Study