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Optikos designed and manufactured a custom wafer overlay imaging module featuring sub‑micron repeatability, metrology‑grade stability, and complete optical and mechanical IP ownership.

Optikos identified and eliminated a critical stray light issue by combining advanced Zemax modeling, precision metrology, and targeted opto‑mechanical redesign—achieving over 10× reduction in unwanted reflections.

View/print as a PDF Primary Challenges & Breakthroughs Overview The world of lens manufacturing is ruled by three important production parameters: quality, investment, and time. Within this matrix, the testing phase of optical systems is paramount because of the “zero-tolerance for defects” nature of the sector. What garners criticality around this phase of the manufacturing process is the rapid growth

Introduction to the Project This was a fun project and a pretty unique one too. Our customer was looking to acquire high-resolution imagery underwater, and they’d built some prototypes using a lens you might find in a Nikon or Canon camera and came to us asking if we could create a corrector window for that lens to give us the